Organosilicone thin films were prepared through plasma polymerization (pp) in a plasma enhance chemical vapour deposition (PECVD) system, utilizing hexamethyldisilazane (HMDSN) as a monomer precursor, at varying distances (25 mm, 35 mm, 45 mm, 55 mm, and 65 mm) from the plasma source to the substrate. Research has examined how the distance between the substrate and plasma source impacts the properties of thin films, including their thickness, surface morphology, and photoluminescence (PL). It was discovered that as the distance increased, both film thickness and PL intensity also increased. Additionally, the film was observed to be more uniform and smoother when deposited 45 mm below the plasma source.